1. A specific thin-film technology is based on the use of Copper Indium Diselenide (CIS) material.
   还有一种基于使用铜铟硒化合物（CIS)材料的特殊薄膜技术。
2. A 77.5% of reduction in deposit formation could be obtained when the multiplex additive of tetralin/ tetralone binary donor and diphenyl diselenide was added into n-dodecane.
   复合添加剂比单一试剂效果更明显，二元供氢剂与二苯二硒的复合添加剂可减少77.5%的裂解沉积。

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