Continuing patent application
（重定向自Continuing application）
Under United States patent law, a continuing patent application is a patent application that follows, and claims priority to, an earlier-filed patent application.
A continuing patent application may be one of three types: a continuation, divisional, or continuation-in-part. Although continuation and continuation-in-part applications are generally available in the U.S. only, divisional patent applications are also available in other countries, as such availability is required under Article 4G of the Paris Convention.