Several amorphic carbon films with different thickness were deposited on single crystal silicon by means of pulse laser ablating graphet target at room temprature.

用激光烧蚀石墨靶方法在单晶硅衬底表面沉积了不同厚度的非晶碳膜。

Pure single crystal silicon, as an important semiconductor, has already been used in many areas, such as molectron, computer technology, communication technology and automatic technology.

高纯的单晶硅是一种重要的半导体材料，在很多领域都有广泛应用，比如集成电路、电脑技术、通讯技术、自动化技术等领域。