Nanoimprint lithography
（重定向自Nanoimprint）
![Nanoimprint proximity effect. Top: Array of depressions is more quickly filled at the edge than the center, resulting in less imprinting at the center of the array. Bottom: The wide space between two groups of protrusions tends to be filled slower than the narrow spaces between the protrusions, resulting in the formation of holes in the unpatterned area.](/Images/godic/202501/29/Nanoimprint_proximity_effect.svg1715.png")
Nanoimprint lithography is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monomer or polymer formulation that is cured by heat or UV light during the imprinting. Adhesion between the resist and the template is controlled to allow proper release.