Electron beam physical vapor deposition
（重定向自Electron beam evaporation）
![Electromagnetic Alignment Fig 1. The ingot is held at a positive potential relative to the filament. To avoid chemical interactions between the filament and the ingot material, the filament is kept out of sight. A magnetic field is employed to direct the electron beam from its source to the ingot location. An additional electric field can be used to steer the beam over the ingot surface allowing uniform heating.](/Images/godic/202501/11/Electron_Beam_Deposition_0011317.jpg")
![Schematischer Aufbau einer Elektronenverdampfer-Kammer](/Images/godic/202501/11/Edited_EBPVD1317.jpg")
Electron Beam Physical Vapor Deposition or EBPVD is a form of physical vapor deposition in which a target anode is bombarded with an electron beam given off by a charged tungsten filament under high vacuum. The electron beam causes atoms from the target to transform into the gaseous phase. These atoms then precipitate into solid form, coating everything in the vacuum chamber (within line of sight) with a thin layer of the anode material.